MPC超微顆粒除塵機(jī)是用于 CMOS 圖像傳感器的全自動定向干式除塵系統(tǒng)。配備高分辨率相機(jī)可以識別超微顆粒異物，并引導(dǎo)粘塵機(jī)構(gòu)高精度定向除塵，可去除基板/Sensor上大于700nm的異物。配備高速伺服模組，根據(jù)產(chǎn)能可選單/雙工位，最高產(chǎn)能大于5000pcs/h。可輸出報表，生成MAP圖，同時數(shù)據(jù)可以上傳客戶MES系統(tǒng)。
灰塵檢查及清除，DB檢測
Partical Detection & Cleaning
半導(dǎo)體(光學(xué)模組, Wafer)
Semiconductor(Optical Module, Wafer)
封測行業(yè)(Sensor、R片、IC封測、指紋模組)
Semiconductor Packaging and Testing(Sensor, IR Filter, IC Testing, Fingerprint Module)
基準(zhǔn)環(huán)境：(36pcs/料盤,10%灰塵率)
Baseline:(36pcs/tray,10% Partical Rate)
單工位：> 2500pcs/h；雙工位：> 5000pcs/h
Single Station:> 2500pcs/h; Double Station:> 5000pcs/h
自動檢查、準(zhǔn)確識別
Automatic Inspection, Accurate ldentification
干法清潔，無殘留、無污染
Dry Cleaning, Residue-Free, No Contamination
檢測精度：>0.6um
Detection Accuracy:>0.6um
可動灰塵除去率：>99.9%
Floating Partical Removal Rate:>99.9%
尺寸/Size：W1200mm×D1100mm×H1850mm
重量/Weight：1000KG
1、MPC超微顆粒除塵機(jī)是用于 CMOS 圖像傳感器的全自動定向干式除塵系統(tǒng)。
The MPC Partical Removal Machine is a fully automatic directional dry partical removal system designed forCMOS image sensors.
2、MPC超微顆粒除塵機(jī)配備高分辨率相機(jī)可以識別超微顆粒異物，并引導(dǎo)粘塵機(jī)構(gòu)高精度定向除塵，可去除基板/Sensor上大于700nm的異物。
With a high-resolution camera capable of identifvina ultra-fine particle contaminants. the svstem auides thepartical removal mechanism with high precision to target and remove contaminants larger than 700nm on thesubstrate/sensor.
3、MPC超微顆粒除塵機(jī)配備高速伺服模組，根據(jù)產(chǎn)能可選單/雙工位，最高產(chǎn)能大于5000pcs/h。
With high-speed servo modules, the system offers the option of single or dual stations based on productioncapacity, with a maximum throughput exceeding 5000pcs/h.
4、MPC超微顆粒除塵機(jī)可輸出報表，生成MAP圖，同時數(shù)據(jù)可以上傳客戶MES系統(tǒng)。
The system can generate reports, create MAP diagrams, and upload data to the customer's MES systemsimultaneously.
